Rapid Thermal Process(RTP)

Large Area Rapid Thermal Process - details see: https://www.machineto.com/rapid-thermal-process-rtp-10368133

Place of Origin:Gyeonggi-do South Korea

Brand Name:SNTEK

Model Number:RTP 5000

contact supplier for Rapid Thermal Process(RTP)

PRODUCT SHEET

RTP5000 System is available with 4inch to 6inch wafer capability.
This has been specially developed to meet the requirements of University,
Research Laboratory,LED CHIP manufacturing company.

The Quality control and small-scale production are possible. The high
reliability assures low cost of ownership. The high temperature version can run
annealing processes upto1500°C

APPLICATION

RTA, RTO
Diffusion, Nitridation, Silicidation
Crystallization, Densification
Implant Quality Control

FEATURES

| Square Chamber : Cold wall & contamination-free
| Maximum Temperature: 1000°C
- Reasonable Process Time at Max. Temp. Max. 10minute
| Process Temperature Range: 250°C - 900°C
- Ramping Up: 0-50°C /sec
| 2inch to 6inch wafer available
| Gas mixing capability with MFC
| Optical pyrometer or Thermo-couple control
| Ultimate Pressure : <1X10-2Torr
- High Vacuum (E-6Torr) is Optional
| Atmospheric & Vacuum Process are Possible
| Automation System using PC interface(Option)

| 1500°C High Temperature Version is Optional