magnetron sputtering coating machine

This equipment has a multi-target magnetron sputtering function. It is matched with two magnetron targets and reserves one targe - details see: https://www.machineto.com/magnetron-sputtering-coating-machine-10084028
Machine Type:Glass Coating MachinePlace of Origin:Beijing China (Mainland)Brand Name:SiDoLimModel Number:SG200
sputtering coating machine:sputtering coating   
magnetron sputtering coating machine
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Magnetron sputtering coating machine SG200

(2inch substrates / multi-target co-sputtering)

This equipment has a multi-target magnetron sputtering function. It is matched with two magnetron targets and reserves one target position and one pair of evaporation electrode, which can be used in magnetron sputtering and evaporation. The sputtering target power adopts corrugated pipe structure, it's convenient for adjusting the angle; sputtering target power also adopts intermediate frequency power supply, which can effectively improve the arc discharge of the target and "poisoning" phenomenon, to replace the traditional direct-current power supply. The device is mainly used to develop nano-scale single and multi-layers conductive film, semiconductor film, insulating film, as well as nickel, cobalt and other magnetic materials. Moreover, it can achieve substrate anti-splash cleaning by adding a negative bias on substrate.

Main Technical Specifications

Vacuum chamberφ350 mm×H400mm [the user can customize the vacuum chamber size, max. Dia.2000mm]
Vacuum systemComposite molecule pump + Direct-connection sliding vane rotary vacuum pump, pneumatic vacuum valve, Digital composite vacuum gauge
Ultimate vacuumBetter than 8.0×10-5Pa
Pumping speedPumped from the atmosphere to 6.0 × 10-3Pa ≤ 15min
Size of Coating filmOne 2-inch sample and a number of loose tablets
Substrate heating and rotationSubstrate heating: normal temperature ~ 500 °C, automatic measurement, PID temperature control; substrate rotation: 0-20 r / min, adjustable and controllable
Sputtering target specificationsTwo 2-inch standard magnetron targets , reserve one target position and one pair of evaporation electrode (IF sputtering + RF sputtering)
Non-uniformity of film thickness≤±5%
ControlManual control
Alarm and protectionIt alarms in time and executes appropriate protection measures when abnormal situations, such as water shortage, over-current, over-voltage and open circuit, happen on pumps, targets and electrodes.
AreaL × W: 1600 × 1400mm

Notes: We can custom equipemts according to your request. If you need to understand more technical indicators, please contact us freely [sale&sidolim.com]

magnetron sputtering coating machine
Packaging Detail:wooden package
Delivery Detail:within 4 months after the order

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