Large anti-reflective and conductive inline magnetron sputtering coating line

Large anti-reflective and conductive inline magnetron sputtering coating line:, 1.Certified ISQ9000., 2.Strong technoloyg - details see: https://www.machineto.com/large-anti-reflective-and-conductive-inline-magnetron-sputtering-coating-line-10162366
Type:Coating Production LineSubstrate:SteelCoating:Vacuum CoatingPlace of Origin:Hunan China (Mainland)
Certification(s)::ISO9000   
Large anti-reflective and conductive inline magnetron sputtering coating line
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Large anti-reflective and conductive inline magnetron sputtering coating line:

Large anti-reflective and conductive inline magnetron sputtering coating machine

The anti-reflective continuous magnetron sputtering coating line has 15 vacuum chambers, among which, one entrance chamber, one exit chamber, one entrance buffering chamber, one exit buffering chamber, one entrance transfer chamber, one exit transfer chamber, two transfer chambers and seven sputtering coating chambers. Each sputtering coating chamber can be equipped with four cathodes simultaneously. The high vacuum chamber is separated by plug valve and can realize the multi-functional coating through changing the atmosphere separation; the carrier is driven by magnetic steering; the equipment has 26 sets of turbo-molecular pumps and 13 sets of mechanical pumps to get the stable pumping speed and even distribution of air.

1.Technical characteristics of production line

Layer

Material

LHLHITO
Sio2Tio2Sio2Tio2GlassTio2Sio2Tio2Sio2ITO
1GlassSio2ITO
2Sio2GlassSio2ITO
3Sio2Tio2GlassSio2ITO
4Sio2Tio2GlassTio2Sio2ITO
5Sio2Tio2Sio2Tio2GlassTio2Sio2ITO
6Sio2Tio2Sio2Tio2GlassTio2Sio2Tio2Sio2ITO

2.Main technical parameters

Final vacuum6 × 1 0E-4 Pa
Average production cycle80180 seconds / frame
Carrier size850 × 1500 (mm) (can be customized on request
Film uniformity± 3%
Large anti-reflective and conductive inline magnetron sputtering coating line
Packaging Detail:Standard package
Delivery Detail:150-180 days after receiving prepayment

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