Home  >  Pharmaceutical & Chemical Product Machinery  >  Pharmaceutical Machinery  >  Film Coating Machines

1.high brightness&wear resistance, 2.mainly suitable for decorative materials, 3.ISO9001-2002, 4.low cost&no pollution - details see: https://www.machineto.com/pvd-ld-c620-magnetron-sputtering-ion-coating-machine-10304956

PVD LD-C600 Magnetron sputtering ion coating machine / customized

The major differences with the multiple arc coating machine:

Adding plane non-equilibrium magnetron sputtering target, it can not only expand the workpieces species and rang, but also make the plating system of membrane layer more exquisite and compact and improved the clarity and appearance quality of the membrane layer. Mostly, we can dope gold silver platinum and other precious metals and silicon, tungsten, molybdenum etc rare elements in traditional coating. This greatly improved the physicochemical properties of membrane layer and make coating quality obtain significantly increased.

Main Features:

High deposition rate, Good film adhesion, High production efficiency, Operation and maintenance easy, But not suitable for plastic and other low-temperature materials.

Main application fields:

All kinds of tool and die:Drill, Mills, Cutters, Reamer, Hob, Broach, Taps, Punch, Die, Extrusion die, Stamping die, Measure, Blades, Bearing, Textile Program, Medical Devices, Hardware, Auto Parts, etc.

Various types of commodities:Glass, Ceramic, Sanitary, Stationery, Watch Glasses, Lamps, Lock, Crystal, Tableware, Jewelry, Mobile, Appliances, Instrumentation, Metal door trim, Beauty tools, Structures jewelry, etc.

Specifacation:

A----Computer automatic control B---- Switch board manual LD----Ion coating

C---- Magnetron sputtering X20---- Two magnetron sputtering target S---- Tool type coating equipment

Vacuum air pump	2X-70Rotary vane pumps
Maintain pump	2X-30Rotary vane pumps
Roots pump	ZJP-150
Diffusion pump	KT-400
Ultimate vacuum	Overmatch6×10¯4 Pa
Work vacuum	6.67×10¯3 Pa
Exhaust speed	Less than 20minutes(atmosphere—work vacuum)
Pressure rising rate(leak rate)	equal or less than 0.35Pa/h
Coating the heating temperature	Common 350-430°C
Temperature control	PID smart temperature control
Grid bias power supply	20KW 20KHz Inverter power supply
Magnetron sputtering rake	Rectangular symmetric 2 non-equilibrium directly to the cooling
the size of the sputtering	w150×h650-750(mm)
The size of the sputtering rake thin	w100×h600-700×δ12 (mm)
Center columnar sputtering target	Two Center columnar sputtering targets
Columnar target structure	Target materials rotating, Crucial directional target
Size ofcolumnar sputtering target	¢70×h650-750(mm)
Magnetron sputtering power	Intermediate frequency pulse: 40KHz, power:30KW
Plane target layout	The furnace door and vent
Columnar target layout	Vacuum chamber center
Coating chamber heating power	15KW Heating tube heating
Vacuum Measurement	3 measuring point wide-range compound vacuum gauge
Gas Mass Flow Meter	4gas mass flow controller
Gas Flow Control	Four-way adjustable gas flow figures
Vacuum chamber distribution gas	Four posts close to furnace wall evenly distributed
System control	6 way pneumatic valve, Safety interlock
Air operated barometric pressure source	General air compressor

Picture shows( equipment & samples):